Pi111
The Pi111 PLUS G3 represents the third generation of a compact PVD coating unit from PLATIT. Its key features are fast cycle times, easy operation and user-friendliness at a favorable price – without compromising coating performance. Having two rotating cathodes utilizing ARC technology, the unit deposits selected PLATIT Signature Coatings at a consistently high level of quality. It is the ideal choice for customers looking to enter the coating world or wanting to add a fast low-volume PVD system to their fleet of machines.
Technologies applied:
- 2 x LARC® PLUS (LAteral Rotating PLUS Cathode) for ARC deposition
Advantages of LARC® PLUS compared to LARC®:
- Improved target utilization (up to 30%)
- Enhanced magnetic-field system, thus increased deposition rate
- Quick cathode exchange
Etching technologies applied:
- LGD® (Lateral Glow Discharge)
- Plasma etching with argon, glow discharge
- Metal ion etching (Ti, Cr)
Load and cycle times:
- Max. coating volume [mm]: ø353 x H498
- Max. coating height with defined coating thickness: 414mm
- Max. load: 160kg
- 4 - 5 batches/day
Modular carousel systems:
- Dual-rotation kicker carousel or triple-rotation gearbox system
Software:
- Simple use and maintenance
- PLATIT’s SmartSoftware (PC and PLC system)
- Modern control system with touch screen
- Data recording and real-time display of process parameters and flow
- Manual and automatic process control
- Remote diagnostics and maintenance
Machine dimensions:
- Footprint [mm]: W2000 x D1550 x H2250