The PL711 is a compact sputter coating unit based on HiPIMS technology (High Power Impulse Magnetron Sputtering). It has two planar HiPIMS cathodes and allows to deposit selected nitride and carbon coatings (DLC2, DLC3) using highly productive processes.
The dense plasma with high ionization in the carousel produces homogeneous coatings and a high deposition rate. Coatings from PL711 provide excellent smooth surfaces while maintaining high density, hardness and outstanding adhesion.
A PL711 coating unit uses 2 planar sputtering cathodes with HiPIMS technology.
Several etching technologies can be used in the PLATIT PL711 coating unit, offering various advantages: