The Pi1511 is a high-volume PVD coating unit. It combines three rotating PLATIT LARC® XL cathodes positioned inside the door with two Planar ARC cathodes in the back of the chamber. The combination of round cathodes with high-performing Planar cathodes allows for the deposition of PLATIT Signature Coatings with familiar flexibility. The LARC® XL cathodes have a very long lifespan and thus guarantee high productivity at a low cost per tool.

Technologies applied:

  • 3 x LARC® XL (LAteral Rotating XL Cathode) inside the door and
    2 x Planar cathode with ARC technology in the back
  • MAC-3C (Magnetic ARC Confinement – Coil Current Compensation) for automated magnetic field adjustment
  • Quick cathode exchange
  • Deposition of PLATIT Signature Coatings

Etching technologies applied:

  • LGD® (Lateral Glow Discharge)
  • Plasma etching with argon, glow discharge
  • Metal ion etching (Ti, Cr)

Load and cycle times:

  • Max. coating volume [mm]: ø715 x H805
  • Max. coating height with defined coating thickness: 711mm
  • Max. load: 400kg
  • 3 batches/day

Modular carousel systems:

  • 1 to 12 axes


  • Simple use and maintenance
  • PLATIT’s SmartSoftware (PC and PLC system)
  • Modern control system with touch screen
  • Statistics and help function via user interface
  • Data recording and real-time display of process parameters and flow
  • Manual and automatic process control
  • Remote diagnostics and maintenance

Machine dimensions:

  • Footprint [mm]: W4900 x D2200 x H2450


Animation video