The PL1011 G4 represents the next generation of a robust PVD coating unit from PLATIT for customers who seek a combination of process reliability and high-quality coatings at a low cost per tool. Its new design speaks for changes and modernization: the simpler construction enables better service; the new technological features such as the Plasma-Nitriding and Double-Pulsed options improve the coating properties and process for various applications. 

As the backbone of every high-volume coating center, PL1011 G4 combines maximum production availability with a user-friendly interface and an efficient maintenance concept. It’s equipped with four Planar cathodes utilizing the latest ARC technology for the deposition of all PLATIT standard coatings in consistently high quality.

Technologies applied:

  • 4 x Planar cathode using ARC technology for depositing

Etching technologies applied:

  • LGD® (Lateral Glow Discharge)
  • Plasma etching with argon, glow discharge
  • Metal ion etching (Ti, Cr)

Load and cycle times:

  • Max. coating volume [mm]: ø715 x H805
  • Max. coating height with defined coating thickness: 711mm
  • Max. load: 400kg
  • 3-4 batches/day

Modular carousel systems:

  • 1 to 12 axes


  • PLATIT SmartSoftware (PC and PLC system) with touch screen
  • Statistics and help function via user interface
  • Data recording and real-time display of process parameters and flow
  • Manual and automatic process control
  • Remote diagnostics and maintenance
  • Newly designed recipe editor

Machine dimensions:

  • Footprint [mm]: W4000 x D2250 x H2350
  • Footprint Double-Pulsed option [mm]: W4700 x D2250 x H2350


Animation video